Medium-frequency generators designed for demanding reactive processes
The homogeneous coating of large surfaces using dual magnetron sputtering puts the highest demands on the chosen power supply. This applies in particular to critical materials and processes such as the reactive application of SiO2 to architectural glass, demanding Al2O3 coating in the production of flat screens or the precipitation of ceramic materials such as Nb2O5 required for the production of thermal insulation glazing.
The TruPlasma MF Series 7000 (G2) generators from TRUMPF Huettinger were developed especially for such demanding processes: The medium-frequency process power supplies of the latest generation enable the application of the thinnest (a few nm), high-strength, absolutely homogeneous layers with a peak efficiency factor of 90 percent and more. As a result, outstanding layer qualities with the highest productivity can be achieved.
The TruPlasma MF Series 7000 (G2) generators are available with an output power between 50 and 150 kW and output currents from 110 to 400 A. Thanks to their broad frequency range of 20 to 70 kHz, which can be adjusted virtually independently of the output power, output current and output voltage, the new product family is highly flexible for ideal tuning to the desired process frequency.
Higher productivity thanks to patented arc management
TRUMPF Huettinger is especially proud of the new and patented arc management.
"Since we have been the global market leader for large surface coating since 1999, we have customer relationships that have lasted for decades and know what ideal arc management should look like. After several years of development, we are now able to officially present the fastest and most reliable arc management in its class. Arc detection takes place within 0.7 nanoseconds and is typically handled within in 0.8 "“ 1.3µs using our 'UltraFastTreatment'. For critical processes in particular, this means a tremendous increase in productivity for our customers compared to previous equipment," explains Nicolas Löffler, Product Manager for MF Technology at TRUMPF Huettinger.
The performance increase is made possible by using highly modern processor technology with real-time data processing. "This in turn enables arc detection practically in real time, even before a rise in the output current depending on the process," Löffler emphasizes.
A reduction to the two essential parameters for arc detection and the fast suppression of the energy supply to the process makes it easy for the user to adjust the optimum balance between the sensitivity of arc treatment and the desired throughput in the process. The ignition process of the plasma can be individually controlled as well, in order to minimize the arc risk.
Voltage controlled transition mode
In order to obtain an optimum sputtering rate and layer quality in reactive processes, the process has to be operated in what is known as transition mode. Here the target is kept in a state between metallic and oxidized. The design of the controllers in the TruPlasma MF Series 7000 (G2) guarantees an especially fast response to changes in this unstable process state. Control of the output power, output current and output voltage with corresponding pre-adjustment depends solely on the target impedance, and switches between the individual controllers without over or under-steering. This makes it possible to increase the output power of the generator from 10 to 90 percent within 10 ms, thereby returning to the transition mode extremely quickly. The stable management of even highly critical processes, for example SiO2 and Al2O3, is possible as a result.
Low operating costs and robust technology for worldwide use
Not only are the requirements for layer quality on the rise, but the cost effectiveness of the processes are increasing in plasma coating as well. "We have consistently optimized the TruPlasma MF Series 7000 (G2) for the low consumption of resources. Peak efficiency factors of up to 91 percent ensure that an operating efficiency of more than 80 percent is achieved, even during partial load operation of 10 percent," is how Ulrich Richter, System Architect of the TruPlasma MF Series 7000 (G2) and Head of Hardware Development at TRUMPF Huettinger, describes the efficiency of the generators. "The corresponding low power loss significantly reduces the consumption of coolant water at the same time."
In order to keep maintenance costs low as well, TRUMPF Huettinger paid special attention to the robust layout of all technical components. This results in a very high level of system availability, even under difficult installation and climate conditions. The generators of the TruPlasma MF Series 7000 (G2) can also be used in tropical countries with no problem since they can handle high coolant water temperatures of up to 45°C and a low differential pressure of 2.5 bar. Furthermore, the thoroughly sealed (IP 54) control cabinet supports operation with dry air purging, preventing the formation of condensate in the unit. The generators can be equipped with additional active control cabinet dehumidification if required.
The design of the TruPlasma MF Series 7000 (G2) generators is highly flexible in regards to electrical characteristics as well. With a broad connected voltage range of 342 to 528 V, they can be used worldwide without technical adaptations. Costly changes to the existing installation on site are therefore, typically not required. The versatile integrated communication interfaces of the TruPlasma MF Series 7000 (G2) are another plus: In addition to common interfaces such as RS232/485, Ethernet, Profibus and A/D2, the new generators will soon support PROFINET as well. "Our customers can therefore be confident they are investing in technology that is flexible and can be used around the globe," Nicolas Löffler affirms.
