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News Article

Epiluvac receives research order for advanced SiC reactor


Epiluvac AB,  the Swedish CVD company, has received an order for its advanced EPI-1000X SiC reactor from a leading European research centre.

The reactor is a single wafer reactor, but due to the very high growth rate, efficient use of the precursors and a minimum of parasitic depositions, it is interesting also for production. The new reactor type is designed with unique gas flows and heating system, with a potential to drastically reduce problems with particles and parasitic depositions, according to Epiluvac.

"This is another step in our ambition to supply the best possible CVD tools to R&D labs around the world," says Bo Hammarlund, managing director of Epiluvac AB. "The reactor design is extremely promising and we are certainly very pleased that we can bring this novel reactor design to the market. There is nothing like this anywhere in the world today."

The new reactor type, still a hot-wall reactor, has been simulated in all details. The temperature profile inside the reactor can be adjusted during the growth cycle with a number of different heat zones in order to optimize uniformity. The installation and commissioning of the system will be completed during the first quarter of 2015.

Epiluvac AB is a management buyout from Aixtron. Its offerings consist of SiC "“ bulk and epi reactors , GaN-pi reactors, Graphene/SiC reactors and also CVD for SiGeSnC and Hydride Vapour Phase Epitaxy (HVPE). Focus is on customer design and advanced R&D reactors which can become production reactors in a few years from now.

 


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