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X-FAB enhances high voltage automotive CMOS

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New second-generation high-voltage primitive devices added to process

X-FAB Silicon Foundries has updated its XP018 high-voltage CMOS semiconductor fabrication platform with new 40V and 60V high-voltage primitive devices, which feature an extended SOA for improved operational robustness.

These second generation high-voltage primitive devices exhibit up to a 50 percent reduction in RDSon figures compared to the previous version.

The XP018 platform is a modular 180nm high-voltage EPI technology solution, based on a low mask count 5V single-gate core module. It supports an extended temperature range of -40 to 175°C and offers a wide range of optional devices and modules, including high-gain bipolar devices, standard and high-capacitance MIM capacitors, multi-threshold (Vt) options, Schottky diodes, and depletion devices.

The platform is supported by high-reliability automotive non-volatile memory solutions, such as embedded Flash, EEPROM, and OTP, making it suitable for cost-sensitive and robust automotive, industrial, and medical applications.

In addition to the new 40V/60V devices, the platform has been enhanced by the inclusion of 5.3V Zener diodes. The new low leakage Zener diode is designed to protect the gate oxide in critical applications, such as wide bandgap gate driver applications. Furthermore, there are also new isolated drain high-voltage devices up to 24V and a new 1.8 V medium Vt option on offer.

Tilman Metzger, product line manager for High-Voltage at X-FAB, comments: “XP018 has been in production for more than a decade and still sees widespread adoption for new designs from our focus market segments: automotive, industrial and medical. The new competitive high-voltage devices and updates will enable our customers to implement more innovative and cost-effective products. Designers using the new XP018 primitive devices have access to comprehensive PDK support across major EDA platforms like Cadence, Siemens EDA, Synopsys, ensuring seamless integration and optimization for a range of applications.”


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