Spirox and Southport announce SiC defect tool
JadeSiC-NK non-destructive inspection system uses non-linear optical technology for whole wafer scanning of SiC substrates
Spirox and its recently acquired subsidiary, Southport, have launched the JadeSiC-NK non-destructive defect inspection system.
JadeSiC-NK employs non-linear optical technology for whole wafer scanning of SiC substrates, identifying killer defects such as (BPD, TSD, MicroPipe, Stacking Fault) within the substrate.
According to the companies, the system is a replacement for high-cost, destructive KOH (potassium hydroxide) etching detection method, leading to increased production yields and process improvement.
Calculating based on the need to etch two substrates for each SiC ingot, they says that JadeSiC-NK can save a substrate manufacturer with 100 crystal growth furnaces approximately $7.68 million in annual costs incurred due to etching losses.
CEO of Spirox, Paul Yang, said: "Through the acquisition of Southport, Spirox aims to accelerate the development process of our own-brand products, expanding from semiconductor packaging and testing equipment to optical inspection. The initial focus is on the highly promising defect inspection of compound semiconductor materials. This move is expected to bring about an exciting new phase for customers, employees, and investors alike."
