Mitsubishi Electric Signs MOU with IIT Madras Research Park
Initiative will support local R&D support for power semiconductor solutions
Mitsubishi Electric India Power Semiconductors, has entered into a Memorandum of Understanding with IIT Madras Research Park to support the programs conducted by the institute for the R&D of power semiconductor solutions.
IIT Madras Research Park is India’s first university-based park that thrives on innovation and entrepreneurship through industrial and academic interactions which support students as well as tech start-ups.
This initiative by Mitsubishi Electric will support and help them by providing components, practical knowledge & workshops to help the students learn the innovative semiconductor technologies and provide power semiconductors as per the requirements of the institute. The company has set-up a support centre to help resolve the queries and provide practical information to support the faculty and students in learning technologies for research and development.
Ashok Jhunjhunwala, Institute professor and president IIT Madras Research Park and IITM Incubation Cell, said: "Make in India requires Design in India. We need the best of components to let our homegrown product compete with imported products and in international market. Our partnership with Mitsubishi Electric India allows us to move towards this larger goal. Our products need to be developed through the best manufacturing process and have superior quality, while still being low cost."
Hitesh Bhardwaj, general manager, Semiconductor and Devices division, Mitsubishi Electric India: "We are delighted to partner with IIT Madras Research Park in its goal to bring technological upliftment in the educational system which can benefit to strengthen the roots of the upcoming generation. Our Power Semiconductor technology holds a prominent position in the global market. We envision to bring technological development in India which is achievable through this initiative of educating the youth and helping them get familiar with the new advancements."
